Flash Lamp Annealing

By means of FLA (Flash Lamp Annealing), it is possible to introduce heat energy into solid-state systems in extremely short pulse times (μs to ms).

Depending on the duration and the energy density of the pulse, the thermal energy input can be controlled specifically.

Specifications

o System DTF – FLA100
o Irradiation area 100 mm (4″)
o Energy densities (0.1 – 22) J/cm²
o Pulse length: (0.4 – 3) ms
o Xe Flashlamps Spectrum: UV-VIS-NIR

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DTF FLA100

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Vacuum chamber and lamp housing of FLA100

Applications

o Realization of flat doping profiles
o Tempering process for temperature-sensitive components and substrates